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Qolab devices at the IQCC

Qolab

Qolab devices at the IQCC

Qolab · superconducting circuits · DEPLOYED (component level) (Dec 2025) · qubits not published · access: cloud via the IQCC

Register profile — the machine's variant of its architecture

qubit type: transmon
gate mechanism: tunable coupler
connectivity: not published
control: room-temperature RF
control placement: room-temp
readout: dispersive
gate evidence: no published figure
flags: no published error rates, source not confirmed

Technologies by layer — the machine's cell per layer

1 Qubit carrier
Transmon · primary ▦ §Component integration (140 mm x 140 mm qubit die, up to 20,000 qubits); §Window-junction process 🔎
transmon; qubit count not disclosed; devices installed at IQCC Tel Aviv Dec 2025, Madison devices via IQCC cloud
2 Encoding
Bare physical qubit (no encoding) · primary ◌ 🔎
Bare two-level subspace — Computational subspace of an anharmonic oscillator; leakage to |2⟩ is the price.
3 Gate mechanism
Tunable-coupler CZ / iSWAP · primary ▨ 🔎
tunable coupler (register); no fidelities published
4 Connectivity / transport
Static nearest-neighbour lattice · primary ▨ 🔎
connectivity not published (register)
5 Control
Room-temperature electronics + per-qubit coax/flex · primary ▦ §Core Capabilities (direct access to microwave and flux pulses; packaging, wiring, filtering, shielding) 🔎
room-temperature RF (register)
6 Readout
Dispersive microwave readout (+TWPA, Purcell) · primary ▦ §Cryogenic integrated circuits (Josephson photomultipliers + SQUID amplifiers replace TWPAs and circulators) 🔎
dispersive readout (register)
7 Code
— none — nothing in this layer ▨ 🔎
no QEC code (L0); no fidelities or coherence published
8 Decoder
— none — nothing in this layer ▨ 🔎
no decoder; no real-time path (register)
9 Interconnect
— none — nothing in this layer ▦ §Component integration (qubit + wiring wafers bonded into a tiling module, capacitively coupled to neighbours) 🔎
monolithic, single module; no interconnect
10 Manufacturing
Superconducting-qubit lithography (Al/AlOx/Al junctions, Nb wiring, 300 mm) · primary ▦ §Window-junction process; SEM figure (a) tilted-angle SEM of the window junction, (b) magnified junction ✅
superconducting fab focus: repeatability, flux-noise reduction, manufacturability
300 mm CMOS foundry (spins, cryo-CMOS, superconducting wiring) · alternate ▦ §Window-junction process (semiconductor-compatible; scales to 300 mm wafers) ✅
manufacturability with advanced semiconductor processes (claimed)
evidence: ✅ 2 / 11