Origin Wukong 102
Origin Wukong 102
Register profile — the machine's variant of its architecture
qubit type: transmon
gate mechanism: tunable coupler
connectivity: planar lattice
control: room-temperature RF
control placement: room-temp
readout: dispersive
gate evidence: no published figure
flags: no published error rates, source not confirmed
Technologies by layer — the machine's cell per layer
| 1 Qubit carrier | |
| 2 Encoding | Bare physical qubit (no encoding) · primary ◌ 🔎 bare transmon two-level subspace; no encoding beyond the physical qubit |
| 3 Gate mechanism | Tunable-coupler CZ / iSWAP · primary ▤ SI 'Device' (gate set I, X, √X, Rz, CZ; CZ 40 ns); SI Table S2 (CZ XEB fidelities) ✅ tunable coupler |
| 4 Connectivity / transport | Static nearest-neighbour lattice · primary ▣ SI Fig. S1 (topology of Wukong and region used); Fig. 1 (deep-blue lines = allowed 2Q gates) ✅ planar lattice, degree 4 |
| 5 Control | Room-temperature electronics + per-qubit coax/flex · primary ▤ 🔎 room-temperature RF; in-house measurement-and-control subsystem, Origin Sīnán calibration/scheduling |
| 6 Readout | Dispersive microwave readout (+TWPA, Purcell) · primary ▤ SI 'Device', Table S1 (per-qubit readout F00/F11) ✅ dispersive readout |
| 7 Code | — none — nothing in this layer ◌ title and device section name the 72-qubit Wukong ✅ no QEC experiment names Wukong-102; the earlier note was inherited from Wukong-72 (sweep 7 Oct 2026, source read) |
| 8 Decoder | — none — nothing in this layer ▣ SI Fig. S5 (post-selection rates vs measurement basis); Results text (stabilizer post-selection) ✅ no real-time decoder; offline decoding of post-selected d=2 / [[4,1,2]] runs |
| 9 Interconnect | |
| 10 Manufacturing | Superconducting-qubit lithography (Al/AlOx/Al junctions, Nb wiring, 300 mm) · primary ◌ 🔎 superconducting-qubit lithography (Origin Quantum, in-house chip); no machine-specific fab source |
evidence: ✅ 6 / 10